- maskless lithography
- безмаскова [безрезистова] літографія (прямим малюванням пучками електронів)
English-Ukrainian dictionary of microelectronics. 2013.
maskless lithography
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Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is … Wikipedia
Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges … Wikipedia
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of … Wikipedia
Nanolithography — Part of a series of articles on Nanoelectronics Single molecule electronics … Wikipedia
Microelectromechanical systems — (MEMS) (also written as micro electro mechanical, MicroElectroMechanical or microelectronic and microelectromechanical systems) is the technology of very small mechanical devices driven by electricity; it merges at the nano scale into… … Wikipedia
Elektronenstrahllithografie — Die Elektronenstrahllithografie (ESL, englisch electron beam lithography oft als e beam lithography abgekürzt) ist in der Mikro und Halbleitertechnik ein spezielles Verfahren zur Strukturierung einer Elektronenstrahl empfindlichen Schicht… … Deutsch Wikipedia
Nanochannel glass materials — are complex glass structures containing large numbers of parallel hollow channels. Source: Naval Research Laboratory Technology Transfer Office. Nanochannel glass materials are an experimental mask technology that is an alternate method for… … Wikipedia
CEA-Leti — (Laboratoire d electronique des technologies de l information) ist ein Forschungsinstitut für Elektronik und Informationstechnologie mit Sitz in Grenoble. Es ist eines der größten Institute für anwendungsorientierten Forschung in Mikroelektronik… … Deutsch Wikipedia
Institut für Mikroelektronik Stuttgart — Vorlage:Infobox Hochschule/Studenten fehltVorlage:Infobox Hochschule/Professoren fehlt Institut für Mikroelektronik Stuttgart Gründung … Deutsch Wikipedia
